发明名称 PRODUCTION METHOD OF PROTECTIVE FILM
摘要 PROBLEM TO BE SOLVED: To provide a production method of a protective film having excellent flatness on a substrate having a step.SOLUTION: The production method of a protective film includes steps of: applying a photosensitive resin composition containing a polymer (A), a (meth)acrylic compound (B), a polymerization initiator (C) and a solvent (E) on a rugged substrate to form a coating film; and exposing the coating film formed on a recessed part and a projected part of the rugged substrate through a multi-gradation mask in which the transmittance in a position corresponding to the recessed part is higher than the transmittance in a position corresponding to the projected part. The coating film is exposed through a multi-gradation mask in which the transmittance in a position corresponding to the recessed part is 60 to 100% and the transmittance in a position corresponding to the projected part is 10 to 50%.
申请公布号 JP2014026136(A) 申请公布日期 2014.02.06
申请号 JP20120166677 申请日期 2012.07.27
申请人 SUMITOMO CHEMICAL CO LTD 发明人 SHIRAKAWA MASAKAZU
分类号 G03F7/20;G02B5/20;G03F1/00;G03F7/033;G03F7/09 主分类号 G03F7/20
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