发明名称 THERMALLY CONTROLLED REFRACTORY METAL RESISTOR
摘要 A structure and method of fabricating the structure includes a semiconductor substrate having a top surface defining a horizontal direction and a plurality of interconnect levels stacked from a lowermost level proximate the top surface of the semiconductor substrate to an uppermost level furthest from the top surface. Each of the interconnect levels include vertical metal conductors physically connected to one another in a vertical direction perpendicular to the horizontal direction. The vertical conductors in the lowermost level being physically connected to the top surface of the substrate, and the vertical conductors forming a heat sink connected to the semiconductor substrate. A resistor is included in a layer immediately above the uppermost level. The vertical conductors being aligned under a downward vertical resistor footprint of the resistor, and each interconnect level further include horizontal metal conductors positioned in the horizontal direction and being connected to the vertical conductors.
申请公布号 US2014038381(A1) 申请公布日期 2014.02.06
申请号 US201314048629 申请日期 2013.10.08
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LUKAITIS JOSEPH M.;MASSEY DEBORAH M.;SULLIVAN TIMOTHY D.;WANG PING-CHUAN;WATSON KIMBALL M.
分类号 H01L49/02 主分类号 H01L49/02
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