SUBSTRATE PROCESSING APPARATUS, AND INSPECTION PERIPHERY EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that prevents occurrence of trouble in an exposure apparatus during exposure processing by an immersion method, and to provide an inspection periphery exposure apparatus.SOLUTION: An edge exposure part EEW comprises: a projection part 510; a projection part holding unit 520; a substrate rotating unit 540; an outer peripheral edge detecting unit 550; and a surface inspection processing unit 580. The projection part 510 is moved in an X-direction and a Y-direction by operation of each part of the projection part holding unit 520. The projection part 510 irradiates a peripheral edge part of a substrate W with light transmitted from an exposure light source through a light guide. Edge sampling processing is performed on the basis of distribution of an amount of light received in a CCD line sensor 553 of the outer-peripheral edge detecting unit 550. Surface inspection processing is performed on the basis of the distribution of the amount of the light received in the CCD line sensor 583 of the surface inspection processing unit 580.