MANUFACTURING METHOD OF PHOTO-CVD FILM AND MANUFACTURING APPARATUS OF PHOTO-CVD FILM

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method and a manufacturing apparatus of a photo-CVD film capable of facilitating further improvement of uniformity of film thickness.SOLUTION: A manufacturing of a phot-CVD film includes (a) step of introducing material gas of the photo-CVD film to a reaction chamber that deposits the photo-CVD film and setting the reaction chamber at a predetermined pressure, (b) step of terminating the introduction of the material gas to the reaction chamber and emission of the material gas from the reaction chamber and radiating light to the reaction chamber, and (c) step of terminating the irradiation and emitting the material gas from the reaction chamber, and steps (a) to (C) are repeated multiple times.