发明名称 |
LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate. |
申请公布号 |
JP2014027308(A) |
申请公布日期 |
2014.02.06 |
申请号 |
JP20130228111 |
申请日期 |
2013.11.01 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
CADEE THEODORUS PETRUS MARIA;JACOBS JOHANNES HENRICUS WILHELMUS;NICOLAAS TEN KATE;LOOPSTRA ERIK ROELOF;ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL;JEROEN JOHANNES SOPHIA MARIA MERTENS;CHRISTIANUS GERARDUS MARIA DE MOL;MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS;VAN DER NET ANTONIUS J;OTTENS JOOST JEROEN;QUAEDACKERS JOHANNES ANNA;REUHMAN-HUISKEN MARIA ELISABETH;MARCO COELHO STAUFEN;TINNEMANS PATRICIUS ALOYSIUS J;VERHAGEN MARTINUS CORNELIS MARIA;VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS;DE JONG FREDERIK EDUARD;GOORMAN KOEN;MENCHTCHIKOV BORIS;BOOM HERMAN;STOYAN NIHTIANOV;MOERMAN RICHARD;SMEETS MARTIN FRANS PIERRE;SCHOONDERMARK BART LEONARD PETER;JANSSEN FRANCISCUS JOHANNES JOSEPH;RIEPEN MICHEL |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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