LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A lithographic apparatus having two substrate tables (WTa, WTb) or two support structures for patterning devices that are positioned by planar motors acting against a magnet plate (13) has one or more balance masses (11, 12) also driven against the magnet plate so as to minimize movement of the magnet plate. Thereby, non-repeating positioning errors related to variations in the position of the magnet plate are reduced.