| 摘要 |
PURPOSE: A monitoring device and a monitoring method using the same are provided to easily analyze residual gas by including an auxiliary chamber on one side of a main chamber. CONSTITUTION: An auxiliary chamber(20) is formed on one side of a main chamber. The auxiliary chamber is selectively connected to the main chamber. A pressure control unit(30) controls the pressure of the main chamber and the auxiliary chamber. A mass spectrograph(40) is connected to the auxiliary chamber. The mass spectrograph analyzes residual gas components in the auxiliary chamber. |
