发明名称 SUBSTRATE FOR SEMICONDUCTOR DEVICE COATED WITH POLYMER FLIM AND METHOD THEREOF
摘要 The present invention relates to a substrate for a semiconductor device coated with a polymer film and a method thereof. According to one embodiment of the present invention, the method of manufacturing a substrate for a semiconductor device includes a step of preparing each polymer film; a step of placing the polymer film on a basic material; and a step of emitting a laser.
申请公布号 KR101359276(B1) 申请公布日期 2014.02.06
申请号 KR20120084148 申请日期 2012.07.31
申请人 POSCO 发明人 BAEK, JE HOON;LEE, JAE RYUNG;PARK, YOUNG JUN;KIM, KYOUNG BO;KIM, JONG SANG
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
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