发明名称 METHOD FOR MANUFACTURING PHOTOSENSITIVE ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a photosensitive element, in which temperature of a coating liquid can be varied as desired within the range from 15°C to 45°C, and by which qualities and thickness of a photosensitive element are maintained uniform in a width direction thereof at a set temperature and the appearance of a photosensitive element is improved, thereby to obtain a photosensitive element having uniform thickness.SOLUTION: A method for manufacturing a photosensitive resin element is provided, including steps of: (1) supplying a photosensitive resin liquid at a temperature controlled to be within ±0.25°C allowance with respect to a target temperature set in the range from 15°C to 45°C, to a coating device including a die head set on a trestle and a backup roll arranged along a longitudinal axis of the die head; and (2) discharging the photosensitive resin liquid from the coating device onto a substrate film set on the backup roll and applying the photosensitive resin liquid to the substrate film to obtain a photosensitive element.
申请公布号 JP2014026107(A) 申请公布日期 2014.02.06
申请号 JP20120166094 申请日期 2012.07.26
申请人 ASAHI KASEI E-MATERIALS CORP 发明人 TSUKUMO HIROSHI;SHIMADA TADASHI
分类号 G03F7/004;B05C5/02;B05C11/10;B05D1/26;G03F7/16 主分类号 G03F7/004
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