| 摘要 |
PURPOSE: A gas wiping apparatus is provided to reduce the pressure or flow rate of gas in a main gas wiping area by partially removing plating materials attached to a steel plate before finally adjusting the amount of the plating materials on the steel plate. CONSTITUTION: A gas wiping apparatus comprises a first gas wiping unit(10) and one or more second gas wiping units(30). The first gas wiping unit adjusts the amount of plating materials attached to a plated steel plate(S) which has passed through a plating bath. The second gas wiping units are provided under the first gas wiping unit and preliminarily remove a part of the plating layer. The first gas wiping unit comprises a first wiping nozzle part which is connected to a first chamber(12) and implements gas wiping with the first chamber to finally adjust the amount of plating materials attached to the plated steel plate. The second gas wiping units are arranged between the first gas wiping unit and the plating bath in the progressing direction of the plated steel plate. |
