发明名称 PATTERN FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a pattern formation method capable of forming a fine pattern with a simple process.SOLUTION: A pattern formation method includes the steps of: forming a first pattern 21 made of a water soluble resin at a metal base 10; forming a second pattern 31 made of a non water soluble material in a region on one surface 11 of the metal base 10 that is different from a region where the first pattern 21 is formed; and peeling the first pattern 21 with a peeling solution composed mainly of water.
申请公布号 JP2014027128(A) 申请公布日期 2014.02.06
申请号 JP20120166736 申请日期 2012.07.27
申请人 SEIKO EPSON CORP 发明人 KAMAKURA TOMOYUKI;HIRAI TOSHIMITSU
分类号 H05K3/06;C23F1/00;H01L21/3213;H01L21/768 主分类号 H05K3/06
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