A substrate for a display device of the present invention has a lamination structure where a matrix; an interface layer; and a coating layer are successively stacked. The matrix includes a silicon-based rubber. The interface layer includes a silicon-based rubber of which density is greater than that of the matrix. The flatness (Ra) of the coating layer is 30 nm or less. The substrate for a display device of the present invention is to improve surface bend by using a specific plasma process.
申请公布号
KR20140015067(A)
申请公布日期
2014.02.06
申请号
KR20120082767
申请日期
2012.07.27
申请人
CHEIL INDUSTRIES INC.
发明人
KIM, TAE HO;LEE, SANG KEOL;CHOI, SEOK WON;KIM, TAE JUNG;KWAK, BYEONG DO;KIM, YOUNG KWON;JEONG, EUN HWAN;IM, SUNG HAN;LEE, WOO JIN