METHOD OF MANUFACTURING REFLECTION MASK FOR EUV EXPOSURE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing reflection mask for EUV exposure capable of obtaining high inspection sensitivity during appearance defect inspection of a reflection mask for EUV exposure by suppressing excessive defect inspection due to shot error of an electron beam.SOLUTION: In the mask pattern drawing for forming a plurality of die patterns by performing electron beam drawing of a resist on a reflection mask blank for EUV exposure, the mask pattern of a reflection mask for EUV exposure has a plurality of the same die patterns including a die pattern for inspection and a die pattern for comparison. Drawing is carried out while shifting the position of shot partition of the electron beam for inspection die pattern and comparison die pattern.