发明名称 NOZZLE UNIT
摘要 PROBLEM TO BE SOLVED: To provide a nozzle unit which allows for high definition of a thin film pattern.SOLUTION: In a nozzle case, a liquid chamber for housing a photocurable liquid thin film material is defined. The liquid thin film material in the liquid chamber is discharged from a plurality of nozzle holes. A light source radiates light of a wavelength region for curing the liquid thin film material in the discharging direction of liquid thin film material from the nozzle hole. A support member supports the light source. The support member is attached to the nozzle case.
申请公布号 JP2014027078(A) 申请公布日期 2014.02.06
申请号 JP20120165539 申请日期 2012.07.26
申请人 SUMITOMO HEAVY IND LTD 发明人 ISO KEIJI
分类号 H05K3/28 主分类号 H05K3/28
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