发明名称 GRAY SCALE MASK AND COLUMN SPACER FORMED USING SAME
摘要 <p>A gray scale mask (100) and a column spacer formed using same. The gray scale mask (100) comprises a transparent substrate and a light shield layer formed thereon. The light shield layer comprises a partial exposure region (120), the partial exposure region (120) comprises at least one annular slit. A column spacer formed using the gray scale mask (100). An upper surface of the column spacer formed under the partial exposure region (120) comprises an annular protrusion and groove corresponding to the annular slit. The cost of the gray scale mask (100) is lower than that of a conventional semi-permeable membrane mask, and the column spacer formed using the gray scale mask (100) can favorably prevent a relative offset between a thin film transistor array substrate and a color filter substrate (300), thereby improving the picture quality of a liquid crystal display device, and also providing a large threshold interval of the drop amount of liquid crystal.</p>
申请公布号 WO2014019310(A1) 申请公布日期 2014.02.06
申请号 WO2012CN85766 申请日期 2012.12.03
申请人 BOE TECHNOLOGY GROUP CO., LTD.;BEIJING BOE DISPLAY TECHNOLOGY CO., LTD. 发明人 WU, HONGJIANG;HUANG, CHANGGANG;LI, MIN
分类号 G03F1/00;G02F1/13;G02F1/1339 主分类号 G03F1/00
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