发明名称 MEMORY DEVICE AND METHOD OF MANUFACTURING MEMORY STRUCTURE
摘要 An exemplary memory device includes a substrate and two word lines extending on the substrate. The substrate includes an active area. The two word lines are formed on the active area. Each word line includes a recessed portion corresponding to the active area. The recessed portion is defined by a planar top surface.
申请公布号 US2014036565(A1) 申请公布日期 2014.02.06
申请号 US201213565289 申请日期 2012.08.02
申请人 LIN SHIAN JYH;HUANG JEN JUI;NANYA TECHNOLOGY CORPORATION 发明人 LIN SHIAN JYH;HUANG JEN JUI
分类号 H01L21/768;G11C5/06 主分类号 H01L21/768
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