发明名称 |
Methods For Making A Mask For An Integrated Circuit Design |
摘要 |
A method for making a mask for an integrated circuit (IC) design includes receiving an IC design layout having a plurality IC features and performing a targeted-feature-surrounding (TFS) checking operation to identify a targeted-feature-surrounding-location (TFSL) in the IC design layout. The method also includes inserting a phase-bar (PB) to the TFSL, performing an optical proximity correction (OPC) to the IC design layout having the PB to form a modified IC design layout and providing the modified IC design layout for fabrication of the mask. |
申请公布号 |
US2014040838(A1) |
申请公布日期 |
2014.02.06 |
申请号 |
US201213564019 |
申请日期 |
2012.08.01 |
申请人 |
LIU RU-GUN;CHOU SHUO-YEN;NG HOI-TOU;HSIEH KEN-HSIEN;CHEN YI-YIN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIU RU-GUN;CHOU SHUO-YEN;NG HOI-TOU;HSIEH KEN-HSIEN;CHEN YI-YIN |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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