发明名称 |
VAPOR-DEPOSITED FILM HAVING BARRIER PERFORMANCE |
摘要 |
Such a vapor-deposited barrier film is provided that has a vapor-deposited layer having uniform film quality, a high film density and high barrier performance in the initial stage. The vapor-deposited barrier film contains a substrate having on at least one surface thereof at least one layer of a vapor-deposited layer (a). The vapor-deposited layer (a) contains a metal oxide, has a thickness of from 10 to 500 nm, and has an average value of an elemental ratio of oxygen (O) and the metal (oxygen (O)/metal) of 1.20 or more and 1.90 or less and a difference between the maximum value and the minimum value of the (oxygen (O)/metal) of 0.35 or less on analysis of the vapor-deposited layer in the depth direction thereof by an X-ray photoelectron spectroscopy (ESCA) method. |
申请公布号 |
EP2692521(A1) |
申请公布日期 |
2014.02.05 |
申请号 |
EP20120762867 |
申请日期 |
2012.03.29 |
申请人 |
MITSUBISHI PLASTICS, INC. |
发明人 |
KIMURA, SHIGETO;HACHISUKA, TOORU;YAMAUCHI, KOJI;YOSHIDA, SHIGENOBU |
分类号 |
B32B9/00;C23C14/56 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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