发明名称 NITRIDE BASED TRANSISTOR AND METHOD OF FABRICATING THE SAME
摘要 Disclosed are a nitride based transistor and a method of fabricating the same. The nitride based transistor includes an upper surface, a lower surface, a slope connected from the upper surface to the lower surface, a semiconductor stack structure including a nitride based semiconductor layer, and a first regrowth layer formed on a part of the slope. The first regrowth layer is made of a nitride based semiconductor layer. The composition of the first regrowth layer is different from that of the nitride based semiconductor layer in a part of a lower slope. Thereby, a vertical-type nitride based transistor using a heterojunction structure of the semiconductor stack structure and the first regrowth layer can be provided.
申请公布号 KR20140013193(A) 申请公布日期 2014.02.05
申请号 KR20120079277 申请日期 2012.07.20
申请人 SEOUL SEMICONDUCTOR CO., LTD. 发明人 TAKEYA MOTONOBU;LEE, KANG NYUNG;LEE, KWAN HYUN
分类号 H01L29/778;H01L21/335 主分类号 H01L29/778
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