ALIGNMENT OF AN INTERFEROMETER MODULE FOR AN EXPOSURE TOOL
摘要
The invention relates to a differential interferometer module adapted for measuring a direction of displacement between a reference mirror and a measurement mirror. In an embodiment the differential interferometer module is adapted for emitting three reference beams towards a first mirror and three measurement beams towards a second mirror for determining a displacement between said first and second mirror. In a preferred embodiment the same module is adapted for measuring a relative rotation around two perpendicular axes as well. The present invention further relates to a lithography system comprising such a interferometer module and a method for measuring such a displacement and rotations.
申请公布号
EP2691734(A1)
申请公布日期
2014.02.05
申请号
EP20120712417
申请日期
2012.03.30
申请人
MAPPER LITHOGRAPHY IP B.V.
发明人
DE BOER, GUIDO;OOMS, THOMAS ADRIAAN;VERGEER, NIELS;COUWELEERS, GODEFRIDUS CORNELIUS ANTONIUS