发明名称 |
GAS BARRIER LAMINATE FILM, AND METHOD FOR PRODUCING SAME |
摘要 |
<p>The present invention provides a gas barrier laminate film containing a substrate film having on at least one surface thereof plural layers of an inorganic thin film layer, from a first layer to an n-th layer (wherein n represents an integer of 1 or more) of the inorganic thin film layer on a side of the substrate film being formed by a non-plasma film forming method, and an (n+1)-th layer formed thereon in contact therewith being formed by a facing target sputtering method, and a method for producing a gas barrier laminate film containing a substrate film having on at least one surface thereof one or plural layers of an inorganic thin film layer, the method containing: forming from a first layer to an n-th layer of the inorganic thin film layer on a side of the substrate film by a non-plasma film forming method; and forming an (n+1) -th layer thereon in contact therewith by a facing target sputtering method, and thus provides a gas barrier laminate film with high gas barrier property and excellent productivity having a dense inorganic thin film layer that inflicts less damage to a substrate film, particularly to a resin film, on which the inorganic thin film layer is formed, and a method for producing the same.</p> |
申请公布号 |
EP2692523(A1) |
申请公布日期 |
2014.02.05 |
申请号 |
EP20120765371 |
申请日期 |
2012.03.29 |
申请人 |
MITSUBISHI PLASTICS, INC. |
发明人 |
AMANAI, HIDETAKA;MIYAZAKI, MAKOTO |
分类号 |
B32B9/00;B32B33/00;C23C14/06;C23C14/34;C23C14/35 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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