| 摘要 |
According to an embodiment of the present invention, an epitaxial reactor includes a susceptor holding a wafer; a susceptor support shaft supporting the susceptor; a lift pin selectively supporting the wafer, and moving up and down by penetrating a pin hole formed in the susceptor; a lift pin support shaft elevating the lift pin; and a pin guide member capable of being combined with the susceptor and having a hole allowing penetration of the lift pin. |
