发明名称 |
PHOTO-PATTERNABLE AND DEVELOPABLE SILESQUIOXANE RESINS FOR USE IN DEVICE FABRICATION |
摘要 |
<p>A coatable resin solution capable of forming a coating when applied to the surface of a substrate that is photo-patternable and developable as a dielectric material upon exposure to ultraviolet radiation is provided. The resin solution comprises a silsequioxane-based (SSQ-based) resin, at least one initiator, and an organic solvent. The SSQ-based resin includes both a hydride component and at least one photo-curable component. The resulting coating exhibits a dielectric constant that is less than or equal to about 3.5.</p> |
申请公布号 |
EP2691810(A1) |
申请公布日期 |
2014.02.05 |
申请号 |
EP20120756840 |
申请日期 |
2012.03.28 |
申请人 |
DOW CORNING CORPORATION |
发明人 |
FU, PENG-FEI;MOYER, ERIC, S.;SUHR, JASON |
分类号 |
G03F7/075 |
主分类号 |
G03F7/075 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|