| 摘要 |
The invention is a stereolithography machine (1) comprising the following: a container (3) suited to contain a fluid substance and comprising a transparent bottom (3a); a support plate (2) provided with a hole (2a) and designed to house the container (3) so that the transparent bottom (3a) faces the hole (2a); a radiation source (4) arranged below the support plate (2) and suited to convey a radiation beam towards the transparent bottom (3a) through the hole (2a); a temperature control unit (5) suited to maintain the support plate (2) at a predetermined temperature. |
