发明名称 Photocatalytic reactions in nano-imprint lithography processes
摘要 An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e.g., organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.
申请公布号 US8641941(B2) 申请公布日期 2014.02.04
申请号 US201213446364 申请日期 2012.04.13
申请人 FLETCHER EDWARD BRIAN;XU FRANK Y.;MOLECULAR IMPRINTS, INC. 发明人 FLETCHER EDWARD BRIAN;XU FRANK Y.
分类号 B29C59/02 主分类号 B29C59/02
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