发明名称 |
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF TRANSPORTING SUBSTRATE, AND RECORDING MEDIUM |
摘要 |
<p>A substrate processing apparatus can continue with substrate processing without the shortage of substrates necessary for batch processing even when the substrates are stagnated due to an abnormal condition during the transfer of the substrates. When an abnormal condition is detected during the transfer of the substrates, a control unit identifies a part where the abnormal condition occurs, selects a fall-back operating table where the processing contents are defined for each unit of the substrate processing apparatus including the part where the abnormal condition occurs according to the processing situation of the substrate, and controls the substrate to be transferred to the selected fall-back operating table.</p> |
申请公布号 |
KR20140012924(A) |
申请公布日期 |
2014.02.04 |
申请号 |
KR20130163918 |
申请日期 |
2013.12.26 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
MIZUGUCHI YASUHIRO |
分类号 |
H01L21/677 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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