发明名称 Method for fabricating monolithic two-dimensional nanostructures
摘要 A patterning method for the creation of two-dimensional nanowire structures. Nanowire patterning methods are used with lithographical patterning approaches to form patterns in a layer of epoxy and resist material. These patterns are then transferred to an underlying thin film to produce a two-dimensional structure with desired characteristics.
申请公布号 US8641912(B2) 申请公布日期 2014.02.04
申请号 US20080125043 申请日期 2008.05.21
申请人 HEATH JAMES R.;WANG DUNWEI;BUNIMOVICH YURI;BOUKAI AKRAM;CALIFORNIA INSTITUTE OF TECHNOLOGY 发明人 HEATH JAMES R.;WANG DUNWEI;BUNIMOVICH YURI;BOUKAI AKRAM
分类号 C23F1/00;B44C1/22 主分类号 C23F1/00
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