发明名称 |
Systems and methods for plasma doping microfeature workpieces |
摘要 |
Systems and methods for plasma doping microfeature workpieces are disclosed herein. In one embodiment, a method of implanting boron ions into a region of a workpiece includes generating a plasma in a chamber, selectively applying a pulsed electrical potential to the workpiece with a duty cycle of between approximately 20 percent and approximately 50 percent, and implanting an ion specie into the region of the workpiece. |
申请公布号 |
US8642135(B2) |
申请公布日期 |
2014.02.04 |
申请号 |
US20050217882 |
申请日期 |
2005.09.01 |
申请人 |
QIN SHU;MCTEER ALLEN;MICRON TECHNOLOGY, INC. |
发明人 |
QIN SHU;MCTEER ALLEN |
分类号 |
C23C14/14;C23C14/16;C23C14/48;C23C16/503;C23C16/505;C23C16/515;H01L21/265;H05H1/46 |
主分类号 |
C23C14/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|