发明名称 METHOD FOR MANUFACTURING NANOSCALE SILVER ELECTRODE PATTERN WITH SOFT MOLD
摘要 PURPOSE: A manufacturing method of a nanoscale silver electrode pattern using a soft mold is provided to transfer silver ink to a touch panel, thereby manufacturing a silver electrode pattern with a linewidth which is less than 80 micrometers. CONSTITUTION: A soft mold(50) including a nanoscale surface roughness(54) and a nanoscale mold pattern(56) is prepared on a surface. Silver ink is charged in the mold pattern. The silver ink of the surface of the soft mold is removed. A silver electrode pattern is formed by transferring the silver ink to a surface of a touch panel. The soft mold is made of polymers. The width of the silver electrode pattern is less than 80 micrometers. The depth of the mold pattern is 5-30 micrometers.
申请公布号 KR101356746(B1) 申请公布日期 2014.02.04
申请号 KR20110134057 申请日期 2011.12.13
申请人 发明人
分类号 G06F3/041;H01B13/00 主分类号 G06F3/041
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