发明名称 CLEANING METHOD OF ELECTRONIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a cleaning method of an electronic material exhibiting high cleaning effect.SOLUTION: In the cleaning method of an electronic material for cleaning an electronic material with hydrogen dissolved water, the electronic material is cleaned with hydrogen dissolved water of 60-90°C. Preferably, the electronic material is cleaned with ultra pure water which is heated to 60-90°C after being deaerated and hydrogen gas is dissolved therein. Preferably, the temperature of the hydrogen dissolved water is 65-85°C. Hydrogen concentration of the hydrogen dissolved water is preferably 0.1-1.4 mg/L, more preferably 0.5-1.2 mg/L.
申请公布号 JP2014022599(A) 申请公布日期 2014.02.03
申请号 JP20120160615 申请日期 2012.07.19
申请人 KURITA WATER IND LTD 发明人 TOKOSHIMA HIROTO
分类号 H01L21/304;G02F1/1333;H01L21/027 主分类号 H01L21/304
代理机构 代理人
主权项
地址