PATTERN INSPECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To allow continuous magnification adjustment without increasing the number of lenses and to suppress the occurrence of an inspection error due to a change in magnification.SOLUTION: A pattern inspection device for inspecting defects of a pattern of a target sample to be inspected includes: an imaging optical system 15 including a plurality of lens groups for forming an image of light transmitted through or reflected by the target sample 11; an image capture sensor 16 which captures the image formed by the imaging optical system 15; moving mechanisms 31 and 32 which move a part of the plurality of lens groups and the image capture sensor 16 in an optical axis direction; a magnification control circuit 25 which controls movement positions by the moving mechanisms 31 and 32 to change an image magnification; an image correction circuit 26 which corrects one of an inspection image and a reference image obtained from design data, in accordance with the changed magnification; and an inspection unit 24 which compares the corrected image with the other of the inspection image and the reference image to perform defect inspection of the pattern.