发明名称 |
LIGHT IRRADIATION DEVICE, NANO-IMPRINT DEVICE, TEMPLATE CLEANING METHOD, AND PATTERN FORMING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide: a light irradiation device which can sufficiently and reliably remove a foreign matter adhering to an object to be irradiated; a nano-imprint device which can reliably form a pattern having less defects; a template cleaning method which can sufficiently and reliably remove resist residues adhering to a template for a nano-imprint; and a pattern forming method which can reliably form a pattern having less defects.SOLUTION: The light irradiation device which has a housing and an ultraviolet light lamp that is disposed in the housing and emits vacuum ultraviolet light has a filter provided between an object to be irradiated and the ultraviolet light lamp, for intercepting or attenuating oblique light an incident angle of which exceeds a specific angle. |
申请公布号 |
JP2014022671(A) |
申请公布日期 |
2014.02.03 |
申请号 |
JP20120162269 |
申请日期 |
2012.07.23 |
申请人 |
USHIO INC |
发明人 |
ENDO SHINICHI;HORIBE DAIKI |
分类号 |
H01L21/027;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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