发明名称 LIGHT IRRADIATION DEVICE, NANO-IMPRINT DEVICE, TEMPLATE CLEANING METHOD, AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide: a light irradiation device which can sufficiently and reliably remove a foreign matter adhering to an object to be irradiated; a nano-imprint device which can reliably form a pattern having less defects; a template cleaning method which can sufficiently and reliably remove resist residues adhering to a template for a nano-imprint; and a pattern forming method which can reliably form a pattern having less defects.SOLUTION: The light irradiation device which has a housing and an ultraviolet light lamp that is disposed in the housing and emits vacuum ultraviolet light has a filter provided between an object to be irradiated and the ultraviolet light lamp, for intercepting or attenuating oblique light an incident angle of which exceeds a specific angle.
申请公布号 JP2014022671(A) 申请公布日期 2014.02.03
申请号 JP20120162269 申请日期 2012.07.23
申请人 USHIO INC 发明人 ENDO SHINICHI;HORIBE DAIKI
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
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