发明名称 METHOD FOR PREPARING SILICON THIN FILM USING ELECTROLYSIS IN NON-AQUEOUS ELECTROLYTE
摘要 The present invention relates to a manufacturing method for a silicon thin film using an electrolytic method in a non-aqueous electrolyte. The manufacturing method for a silicon thin film can directly reduce silicon in an element shape through an electrolytic method at low temperatures (below 200 deg C) and can manufacture a silicon thin film applicable to a semiconductor or a solar cell industry through a simple process and electrolysis condition changes.
申请公布号 KR101356107(B1) 申请公布日期 2014.02.03
申请号 KR20120115628 申请日期 2012.10.17
申请人 KUMOH NATIONAL INSTITUTE OF TECHNOLOGY INDUSTRY-ACADEMIC COOPERATION FOUNDATION 发明人 LEE, CHURL KYOUNG;PARK, JE SIK
分类号 C25D5/00;C25D7/00;C25D17/10 主分类号 C25D5/00
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