发明名称 VACUUM PROCESSING DEVICE AND VACUUM PROCESSING METHOD
摘要 <p>An efficient method of controlling transportation in a linear tool type vacuum process device in a state that a length of time required for a process is not stable. For each process chamber, the number of unprocessed wafers that are in process or are being transported to the process chamber is counted, and in deciding a transport destination of a wafer, when the number of unprocessed wafers is equal to or larger than a charge limit amount, a transport destination of a wafer is decided excluding the process chamber. Also, a wafer holding mechanism on a transport path to a process chamber is reserved, and a transport destination of a processed member to be transported next is decided according to a status of reservation.</p>
申请公布号 KR101357889(B1) 申请公布日期 2014.02.03
申请号 KR20120055932 申请日期 2012.05.25
申请人 发明人
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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