发明名称 LASER PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To quickly start CVD processing.SOLUTION: A gas window 161 retreats outward from a lower part of a laser radiation monitoring unit 162 and moves upward, after stopping supply of raw material gas and the like. A shutter section 165A of a gas shutter 165 is inserted below the gas window 161, and supply of the raw material gas and the like from the gas window 161 is restarted. An interval between the gas window 161 and the shutter section 165A is set almost identical to an interval between the gas window 161 and a workpiece during CVD processing. The present invention can be applied, for example, to a laser repair device.
申请公布号 JP2014019937(A) 申请公布日期 2014.02.03
申请号 JP20120162346 申请日期 2012.07.23
申请人 OMRON CORP 发明人 TANAKA YUKI;YAMAMOTO MASAHIRO
分类号 C23C16/48 主分类号 C23C16/48
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