发明名称 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To allow for manufacturing of a nitride semiconductor device composed of a lamination structure of a nitride semiconductor at low cost in a state in which a substrate shape can be easily controlled and there is a small number of transitions.SOLUTION: First, a semiconductor laminate structure 103 and a first substrate 101 are separated by a separation layer 102 (fourth step). Next, a third substrate 105 is stuck to the separation layer 102 remaining in the semiconductor laminate structure 103 (fourth step). Then, a second substrate 104 is peeled from the semiconductor laminate structure 103 (fifth step). Last, a nitride semiconductor device is manufactured from the semiconductor laminate structure 103 disposed on the third substrate 105 (sixth step).
申请公布号 JP2014022584(A) 申请公布日期 2014.02.03
申请号 JP20120160244 申请日期 2012.07.19
申请人 NIPPON TELEGR & TELEPH CORP <NTT> 发明人 WATANABE NORIYUKI
分类号 H01L21/20;H01L21/02 主分类号 H01L21/20
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