| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus whose components are replaced and which has elapsed time or a plasma processing apparatus which, among a plurality of plasma processing apparatuses, can be calibrated with respect to a plurality of processing conditions and also to provide a calibration method therefor.SOLUTION: In a calibration method, one apparatus parameter of plasma generating conditions is sequentially changed as a reference, a plurality of apparatus parameters of the other plasma generating conditions are respectively sequentially changed with respect to such a sequential change as the reference, and data of an apparatus sensor capable of grasping a plasma state is grasped (S12 to S15). Also in the calibration method, an off-set value is grasped by comparing the data of the apparatus sensor with that of the other apparatus (S16), and plasma generating conditions are adjusted based on the off-set value (S17). Moreover, the apparatus is provided which realizes the calibration method. |
