| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition showing excellent developability in patterning a calcined product thereof and showing excellent adhesiveness to a substrate and excellent interlayer adhesiveness after calcined. SOLUTION: The photosensitive resin composition contains inorganic fine particles, a carboxyl group-containing resin, a propylene oxide-modified trimethylolalkane tri(meth)acrylate and a photopolymerization initiator. COPYRIGHT: (C)2012,JPO&INPIT |
