发明名称 |
METHOD OF PRODUCING DIELECTRIC FILM, METHOD OF PRODUCING THIN-FILM SECONDARY BATTERY AND DIELECTRIC FILM FORMING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of producing a dielectric film, a method of producing thin-film secondary battery and a dielectric film forming apparatus that may suppress dendrite-like precipitation.SOLUTION: A step for depositing a thin film consisting of a dielectric material on an electrode formed on a substrate comprises: a step for superposing an electric conductive mask 15 on the substrate so that a part of the electrode is exposed; and a step for exposing the exposed part to a plasma containing the dielectric material, and at least a part superposed to the electrode of a counter surface BS of the mask 15 facing the electrode has insulation properties. |
申请公布号 |
JP2014019891(A) |
申请公布日期 |
2014.02.03 |
申请号 |
JP20120158454 |
申请日期 |
2012.07.17 |
申请人 |
ULVAC JAPAN LTD |
发明人 |
SASAKI SHUNSUKE;HIROSE MITSUTAKA;ASAKAWA KEIICHIRO;JINBO TAKETO;SU HIROTSUNA |
分类号 |
C23C14/04;H01M4/139;H01M10/052;H01M10/0562;H01M10/0585 |
主分类号 |
C23C14/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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