发明名称 METHOD OF PRODUCING DIELECTRIC FILM, METHOD OF PRODUCING THIN-FILM SECONDARY BATTERY AND DIELECTRIC FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method of producing a dielectric film, a method of producing thin-film secondary battery and a dielectric film forming apparatus that may suppress dendrite-like precipitation.SOLUTION: A step for depositing a thin film consisting of a dielectric material on an electrode formed on a substrate comprises: a step for superposing an electric conductive mask 15 on the substrate so that a part of the electrode is exposed; and a step for exposing the exposed part to a plasma containing the dielectric material, and at least a part superposed to the electrode of a counter surface BS of the mask 15 facing the electrode has insulation properties.
申请公布号 JP2014019891(A) 申请公布日期 2014.02.03
申请号 JP20120158454 申请日期 2012.07.17
申请人 ULVAC JAPAN LTD 发明人 SASAKI SHUNSUKE;HIROSE MITSUTAKA;ASAKAWA KEIICHIRO;JINBO TAKETO;SU HIROTSUNA
分类号 C23C14/04;H01M4/139;H01M10/052;H01M10/0562;H01M10/0585 主分类号 C23C14/04
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