| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam exposure device in which a change in the amount of heat, that flows in due to on/off of a blanking electrode, can be relaxed by a simple method.SOLUTION: The second aperture plate of a charged particle beam exposure device includes a first aperture for passing a charged particle beam selected for drawing, and a second aperture for shielding at least a part of a charged particle beam not selected for drawing. A first aperture plate includes an aperture for passing a charged particle beam from a charged particle beam source, passed through the first aperture, to the exposure surface side, and an aperture plate part for shielding a charged particle beam passed through the second aperture. Difference in the amount of heat by a charged particle beam flowing into the first aperture plate, due to whether or not it is selected for drawing, is reduced by adjusting the size or shape of the first and second apertures and the aperture of the first aperture plate. The second aperture plate is disposed at a position not in conjugate relation with the charged particle beam source or the exposure surface. |
