发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus including means for obtaining the interval between a top plate and a rotating substrate with certainty.SOLUTION: In order to obtain the interval of a top plate (50) and a substrate (W), a range-finding sensor (80) is provided. The range-finding sensor is configured to be able to measure the distance to a range-finding object. The range-finding sensor is attached to the top plate, or a member (e.g., a cup 60) having a fixed position in the vertical direction for a substrate holding part (20). The range-finding sensor is disposed so that a member (e.g., the substrate W or the cup 60), the vertical direction of which from the range-finding sensor changes corresponding to a change in the vertical direction between the substrate held by the substrate holding part and the top plate, becomes the range-finding object.
申请公布号 JP2014022558(A) 申请公布日期 2014.02.03
申请号 JP20120159753 申请日期 2012.07.18
申请人 TOKYO ELECTRON LTD 发明人 AMANO YOSHIFUMI;IWANAGA KAZUYA;AJISHI TAKASHI
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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