| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target of Cu-Ga sintered body capable of further reducing an oxygen content and suppressing an abnormal discharge, and a method for producing the same.SOLUTION: The sputtering target comprises a sintered body, which has a component composition containing 20 at% to less than 30 at% of Ga, and a remainder of Cu and inevitable impurities, in which a diffraction peak attributed to a γ phase and a diffraction peak attributed to a ζ phase of CuGa are observed via an X-ray diffraction. A main peak intensity of the diffraction peak attributed to the ζ phase is more than 10% of a main peak intensity of the diffraction peak attributed to the γ phase, an oxygen content is 100 ppm or less, and a mean particle diameter is 100 μm or less. |
