| 摘要 |
A polymer for forming an organic anti-reflective coating layer having high etch rate and a composition including the same are provided to form an organic anti-reflective coating layer with excellent etch rate and reflection and to effectively suppress undercutting and notching. A polymer for forming an organic anti-reflective coating layer comprises repeating units represented by chemical formula 1. In chemical formula 1, R1 is hydrogen(H) or methyl(-CH3); R2 is S, O or NH; and R3 is a heterocyclic group containing sulfur. Based on the whole repeat unit constituting the polymer for forming an organic anti-reflective coating layer, the mole % of the repeating unit of the chemical formula 1 is 1~99 mole %. |
