发明名称 BIFACIAL SOLAR CELL USING ION IMPLANTATION
摘要 An improved bifacial solar cell is disclosed. In some embodiments, the front side includes an n-type field surface field, while the back side includes a p-type emitter. In other embodiments, the p-type emitter is on the front side. To maximize the diffusion of majority carriers and lower the series resistance between the contact and the substrate, the regions beneath the metal contacts are more heavily doped. Thus, regions of higher dopant concentration are created in at least one of the FSF or the emitter. These regions are created through the use of selective implants, which can be performed on one or two sides of the bifacial solar cell to improve efficiency.
申请公布号 US2014030844(A1) 申请公布日期 2014.01.30
申请号 US201314043115 申请日期 2013.10.01
申请人 GUPTA ATUL;BATEMAN NICHOLAS P.T.;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 GUPTA ATUL;BATEMAN NICHOLAS P.T.
分类号 H01L31/18 主分类号 H01L31/18
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