| 摘要 |
<p>Radiation sensitive material is produced by combining a liquid organosiloxane cpd. with aromatic heterocyclic and/or unsatd. aliphatic gps. with a sensitising agent consisting of one or more azides, dichromates, mercury oxolates, quinones, anthrones, aldehydes and/or cyanide dyes, the sensitising agent transferring energy between the sensitising agent and the organosiloxane cpd. when the radiation sensitive material is irradiated such that the radiated parts of the sensitive material are inaccessible for the developer used for the photolithographic processing, the non-irradiated parts being soluble in the developer, so that when the resin is used for a photolithographic process a patternwise glass-like structure is produced.</p> |
