发明名称 Inspection for lithography
摘要 <p>Determining line edge roughness comprises reflecting at least one radiation beam off the object, observing a first optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a first orientation relative to the object; and observing a second optical response signature from a beam reflected from the object, or a component thereof, being polarized with an electrical vector in a second orientation relative to the object. Line edge roughness can then be determined from the two optical response signatures.</p>
申请公布号 IL229689(D0) 申请公布日期 2014.01.30
申请号 IL20130229689 申请日期 2013.11.28
申请人 ASML NETHERLANDS B.V. 发明人
分类号 G03F 主分类号 G03F
代理机构 代理人
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