| 摘要 |
The invention concerns a method for producing a capacitor, comprising the forming of a capacitor stack in one portion of a substrate (112), said method comprising: the forming of a cavity (165) along the thickness of the portion of the substrate (112) from an upper face of said substrate (112), the depositing of a plurality of layers contributing to the capacitor stack onto the wall of the cavity (165) and onto the surface of the upper face, and a removal of matter from the layers until the surface of the upper face is reached, characterised in that the formation of the cavity (165) comprises the formation of at least one trench (164) and, associated with each trench (164), of at least one box (163), said at least one trench (164) comprising a trench outlet that opens into the box (163), said box (163) comprising a box outlet that opens at the surface of the upper face, the box outlet being shaped so as to be larger than the trench outlet. |
