发明名称 LAMINATED POLISHING PAD AND METHOD FOR MANUFACTURING SAME
摘要 <p>The purpose of the present invention is to provide a method for manufacturing a laminated polishing pad wherein a polishing layer and a supporting layer are not easily peeled from each other even when the temperature of the pad becomes high due to long time polishing, and furthermore, wrinkles are not easily generated in the supporting layer. This method for manufacturing a laminated polishing pad includes a step wherein a stacked body is passed through between a pair of laminate rolls, said stacked body having a polishing layer and a supporting layer laminated with a hot-melt bonding member therebetween, and a laminated polishing sheet is manufactured by bonding the polishing layer and the supporting layer using the hot-melt bonding member. The method is characterized in that the stacked body has the ratio (TD1/TD2) of a polishing layer length (TD1) in the TD direction to a supporting layer length (TD2) in the TD direction constantly adjusted to 0.3 or more.</p>
申请公布号 WO2014017148(A1) 申请公布日期 2014.01.30
申请号 WO2013JP63894 申请日期 2013.05.20
申请人 TOYO TIRE & RUBBER CO., LTD. 发明人 KIMURA,TSUYOSHI
分类号 B24B37/22;H01L21/304 主分类号 B24B37/22
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