发明名称 A PRODUCTION METHOD COMBINING CATHODE ARC METHOD AND MAGNETRON SPUTTERING METHOD TO FORM AN ANTIBACTERIAL FILM ON THE SURFACE OF AN OBJECT
摘要 The present invention provides a production method combining cathode arc method and magnetron sputtering method to form an antibacterial film on the surface of an object, with its main characteristics include: inside the vacuum chamber, both cathode arc target source and magnetron sputtering target source are configured; on the cathode arc target source, at least one of zirconium target, titanium target, or chromium target is installed; on the magnetron sputtering target source, a silver target is installed; fill argon and nitrogen into the vacuum chamber to respectively ionize the silver target and one of the zirconium target, titanium target, or chromium target; use remote control to adjust the ionization proportion between one of the zirconium target, titanium target, or chromium target and the silver target to be 90-99% : 1-9%; based on the above, the surface of the object is formed with one of the zirconium nitride -silver mixed antibacterial film, titanium nitride -silver mixed antibacterial film, chromium nitride -silver mixed antibacterial film; with the present invention, the advantages of cathode arc vapor deposition method featuring high forming speed and the magnetron sputtering method featuring even filming and high coating density can be integrated to provide high production efficiency and good coating quality. Hence, the present invention has practical advancement and good industrialization value.
申请公布号 CA2784264(A1) 申请公布日期 2014.01.30
申请号 CA20122784264 申请日期 2012.07.30
申请人 EVER BRITE TECHNOLOGY PRODUCTS INC. 发明人 CHAO, MING-HSIEN
分类号 C23C14/35;A01N59/16;A01P1/00;C09D5/16;C23C14/06;C23C14/24 主分类号 C23C14/35
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