| 摘要 |
PROBLEM TO BE SOLVED: To provide a firing apparatus that can uniformly fire a glass frit by simple control; and a control method of the same.SOLUTION: A firing apparatus 1 includes: a laserbeam source 3 that emits a laserbeam irradiated to a glass paste 11 applied in a periphery of an emission surface 10a1 on an element side substrate 10a to draw a coating pattern becoming a closed graphic; a moving device 2a, 2b that drive the element side substrate 10a to which the glass paste 11 is applied; and a control device 5. The firing apparatus and a control method are characterized in that the control device 5 moves the element side substrate 10a along the coating pattern from an irradiation starting point on the coating pattern so that the laserbeam is irradiated to the glass paste 11, and moves the element side substrate 10a so that a position other than a coating pattern 11a is irradiated by the laserbeam when the laserbeam is irradiated over the whole circumference of the coating pattern, then the irradiation starting point is irradiated by the laserbeam again. |
